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DEFENCE RESEARCH AND DEVELOPMENT ORGANISATION (DRDO) has floated a tender for Foundry Services for Fabrication of MWIR QCL, Qty: 460. The project location is North Delhi, Delhi (NCT), India. The reference number is GEM/2026/B/8048776 and it is closing on 29 Oct 2026. Suppliers can request Register free of cost to get the complete Tender details and download the document.
Procurement Summary
State: Delhi (NCT)
Summary: Foundry Services for Fabrication of MWIR QCL, Qty: 460
Deadline: 29 Oct 2026
Posting Date: 16 Oct 2026
Other Information
Notice Type: Tender
TOT Ref.No.: 151063873
Document Ref. No.: GEM/2026/B/8048776
Financier: Self Financed
Purchaser Ownership: Public
Document Fees: Refer Document
Tender Value: Refer Document
EMD: Refer Document
Purchaser's Detail
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Login to see detailsTender Details
Plasma cleaner, Wet bench litho pre-post process, Direct writing, DRIE, PECVD, Post plasma cleaning, Wet bench 2 etching, Deposition Ti_Au or Ni_Au 10_300 nm, Wet bench 1 liftoff, Deposition AI 100nm, Deposition Ti_AI_Ni_Au stack, Rapid thermal annealing, Wafer dicer, Optical imaging
Straight Fabrication Coal Pipe (NTPC)
Quantity Required: 460
Start Date: 16-10-2026 9:46 AM
End Date: 29-10-2026 10:00 AM
BOQ Title: Foundry Services for Fabrication of MWIR QCL
Relevant Categories: Straight Fabrication Coal Pipe (NTPC)
GeMARPTS Searched: Hiring of AR/VR Services for Events, Hiring of Consultant for Energy Efficiency Services, Manpower Hiring for Financial Services, Operation And Maintenance Of Fire Fighting System
Tender ID: GEM/2026/B/8048776
Documents
| # | Title | Description | Qty | Unit | Delivery (Days) |
|---|---|---|---|---|---|
| 1 | Plasma cleaner | Plasma cleaner | 15 | hours | 360 |
| 2 | Wet bench litho pre-post process | Wet bench litho pre-post process | 55 | hours | 360 |
| 3 | Direct writing | Direct writing | 95 | hours | 360 |
| 4 | DRIE | DRIE | 50 | hours | 360 |
| 5 | PECVD | PECVD | 15 | hours | 360 |
| 6 | Post plasma cleaning | Post plasma cleaning | 20 | hours | 360 |
| 7 | Wet bench 2 etching | Wet bench 2 etching | 30 | hours | 360 |
| 8 | Deposition Ti_Au or Ni_Au 10_300 nm | Deposition Ti_Au or Ni_Au 10_300 nm | 45 | hours | 360 |
| 9 | Wet bench 1 liftoff | Wet bench 1 liftoff | 30 | hours | 360 |
| 10 | Deposition AI 100nm | Deposition AI 100nm | 20 | hours | 360 |
| 11 | Deposition Ti_AI_Ni_Au stack | Deposition Ti_AI_Ni_Au stack | 30 | hours | 360 |
| 12 | Rapid thermal annealing | Rapid thermal annealing | 10 | hours | 360 |
| 13 | Wafer dicer | Wafer dicer | 20 | hours | 360 |
| 14 | Optical imaging | Optical imaging | 25 | hours | 360 |
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