Prior Information Notice - Sputter Deposition Procurement Plan/GPN/PIN - 143079553

Procurement Summary

Country: Germany

Summary: Prior Information Notice - Sputter Deposition

Deadline: 26 Jul 2026

Posting Date: 11 Jun 2026

Other Information

Notice Type: Procurement Plan/GPN/PIN

TOT Ref.No.: 143079553

Document Ref. No.: 399510-2026

Competition: ICB

Financier: Self Financed

Purchaser Ownership: Public

Tender Value: EUR 4128000

CPV Classification

42990000 - Miscellaneous special-purpose machinery

Purchaser's Detail

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Tender Details

Prior Information Notice - Sputter Deposition The Ferdinand-Braun-Institut (FBH) plans to procure a sputter deposition system within the framework of the EU-funded APECS programme. The system will be used for the deposition of metallic and insulating thin films on semiconductor wafers with diameters of up to 200 mm. It is intended to support advanced heterogeneous integration technologies, including InP-on-Si (BiCMOS) platforms. The equipment shall enable highly controlled thin-film processes such as metallization, interconnect formation, passivation and barrier layer deposition. A multi-chamber cluster system with integrated cleaning and deposition capabilities is required to ensure high process quality and contamination control. The system will be installed in a cleanroom environment and must be compatible with semiconductor manufacturing requirements. The procurement procedure is planned for 2026. Doc Title: Prior Information Notice - Sputter Deposition Contract Type: supplies
Document Type: Prior Information Notice Reference Number: FBH‑05.3 (Sputter Cluster System) Contract Type: supplies Estimated Value: 4128000 - EUR Authority Type: la Doc Title: Prior Information Notice – Sputter Deposition Dispatch Date: 2026-06-10 Publish Date: 2026-06-11 Submission Date: 2026-07-26

Documents

 Tender Notice