Procurement Summary
Country: USA
Summary: Technologybusiness Opportunity Closed Loop Arbitrary Spatial Polarization Shaping Clasps
Deadline: 13 Aug 2026
Posting Date: 17 Jul 2026
Other Information
Notice Type: Tender
TOT Ref.No.: 145318598
Document Ref. No.: 2025-185
Competition: ICB
Financier: Self Financed
Purchaser Ownership: Public
Tender Value: Refer Document
Purchaser's Detail
Name: Login to see tender_details
Address: Login to see tender_details
Email: Login to see tender_details
Login to see detailsTender Details
Opportunity:
Lawrence Livermore National Laboratory (LLNL), operated by the Lawrence Livermore National Security (LLNS), LLC under contract no. DE-AC52-07NA27344 (Contract 44) with the U.S. Department of Energy (DOE), is offering the opportunity to enter into a collaboration to further develop and commercialize its Closed Loop Arbitrary Spatial Polarization Shaping (CLASPS).
Background:
High-energy and high-peak-power pulsed laser systems are enabling technologies for particle acceleration, nuclear fusion, additive manufacturing, defense and more. Newer laser systems continually push the limits of laser pulse energy and peak power to drive stronger laser-matter interactions. There is a pressing need for tighter customization of pulse shaping and tunable polarization in applications such as particle acceleration and coupling laser pulse energy to EUV source materials for increased yield of relevant particles/radiation.
Description:
Performance at bottlenecks of these high energy laser systems can be enhanced by careful manipulation of the laser pulse and laser beam qualities using CLASPS. This enables spatial phase and polarization laser shaping, which can address dynamic thermal birefringence and accumulation of other nonideal optical aberrations that make it difficult to control laser beam wavefronts.
Advantages/Benefits:
Much lower costs vs. deformable mirror wavefront shapers
Much higher laser damage threshold wavefront shaping component technology
Potential Applications:
Polarization/Wavefront shaping for damage-free operation of IFE class laser drivers, high peak power laser based particle accelerators
Key enabling technology for higher EUV photon yield EUV and beyond EUV laser drivers for high throughput semiconductor patterning and manufacture.
Development Status:
Current stage of technology development:
TRL ☒ 0-2 ☐ 3-5 ☐ 5-9
LLNL has filed for patent protection on this invention.
LLNL is seeking industry ...
Notice ID: 2025-185
Department/Ind. Agency: energy, department of
Sub-tier: energy, department of
Office: llns – doe contractor
NAICS Code: 334413 - Semiconductor and Related Device Manufacturing
Inactive Dates: aug 28, 2026
Inactive Policy: 15 days after response date
Documents
Tender Notice