Procurement Summary
Country: Germany
Summary: Tender Procedure for the Delivery of a Vapor Deposition System
Deadline: 05 Oct 2026
Posting Date: 27 Aug 2026
Other Information
Notice Type: Tender
TOT Ref.No.: 148074329
Document Ref. No.: 593298-2026
Competition: ICB
Financier: Self Financed
Purchaser Ownership: Public
Tender Value: Refer Document
CPV Classification
38000000 - Laboratory, optical and precision equipments (excl. glasses)
Purchaser's Detail
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Tender Details
Tender procedure for the delivery of a gas phase deposition system
Tender procedure for the delivery of a vapor phase deposition system The delivery and operational handover including functional test, instruction and acceptance of a system for plasma-enhanced chemical vapor deposition (PECVD) with an inductively coupled plasma source (ICP) for the production of high-quality material films with precisely defined layer thicknesses in the nanometer-micrometer range is tendered. The planned ICP-PECVD system is intended to enable the targeted deposition of dielectric thin films with controllable optical properties and precisely controllable layer thicknesses through in-situ monitoring. High-quality dielectric layers for optical passivation, optical waveguides and multilayer systems as well as hard masks for high-resolution lithography processes are to be deposited. As part of our research work, silicon dioxide, silicon nitride, amorphous silicon and diamond-like carbon layers should be able to be deposited in an optimized manner using a new system. Due to the requirements of the approval process for large equipment, the maximum available...
Document Type: Contract Notice
Reference Number: Uni-HD.2026.642_Gasphasenabweisungsanlage-ICP-PECVD_KIP
Contract Type: supplies
Authority Type: body-pl-ra
Doc Title: Tender procedure for the delivery of a vapor deposition plant
Dispatch Date: 2026-08-25
Publish Date: 2026-08-27
Submission Date: 2026-10-05
Documents
Tender Notice