Tender Procedure for the Delivery of a Vapor Tender - 148074329

The UNIVERSITY OF HEIDELBERG has issued a Tender notice for the procurement of a Tender Procedure for the Delivery of a Vapor Deposition System in the Germany. This Tender notice was published on 27 Aug 2026 and is scheduled to close on 05 Oct 2026, with an estimated Tender value of Refer Document. Interested bidders can access detailed Tender information, eligibility criteria, and complete bidding documents by referencing TOT Ref No. 148074329, while the tender notice number is 593298-2026 and Registering on the platform.

Expired Tender

Procurement Summary

Country: Germany

Summary: Tender Procedure for the Delivery of a Vapor Deposition System

Deadline: 05 Oct 2026

Posting Date: 27 Aug 2026

Other Information

Notice Type: Tender

TOT Ref.No.: 148074329

Document Ref. No.: 593298-2026

Competition: ICB

Financier: Self Financed

Purchaser Ownership: Public

Tender Value: Refer Document

CPV Classification

38000000 - Laboratory, optical and precision equipments (excl. glasses)

Purchaser's Detail

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Tender Details

Tender procedure for the delivery of a gas phase deposition system
Tender procedure for the delivery of a vapor phase deposition system The delivery and operational handover including functional test, instruction and acceptance of a system for plasma-enhanced chemical vapor deposition (PECVD) with an inductively coupled plasma source (ICP) for the production of high-quality material films with precisely defined layer thicknesses in the nanometer-micrometer range is tendered. The planned ICP-PECVD system is intended to enable the targeted deposition of dielectric thin films with controllable optical properties and precisely controllable layer thicknesses through in-situ monitoring. High-quality dielectric layers for optical passivation, optical waveguides and multilayer systems as well as hard masks for high-resolution lithography processes are to be deposited. As part of our research work, silicon dioxide, silicon nitride, amorphous silicon and diamond-like carbon layers should be able to be deposited in an optimized manner using a new system. Due to the requirements of the approval process for large equipment, the maximum available...
Document Type: Contract Notice

Reference Number: Uni-HD.2026.642_Gasphasenabweisungsanlage-ICP-PECVD_KIP

Contract Type: supplies

Authority Type: body-pl-ra

Doc Title: Tender procedure for the delivery of a vapor deposition plant

Dispatch Date: 2026-08-25

Publish Date: 2026-08-27

Submission Date: 2026-10-05

Documents

 Tender Notice


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