Procurement Summary
Country: Germany
Summary: Deep Reactive Ion Etching (Drie) Si Fluorine Chemistry Etcher
Deadline: 28 Apr 2026
Posting Date: 26 Mar 2026
Other Information
Notice Type: Tender
TOT Ref.No.: 138500617
Document Ref. No.: 209081-2026
Competition: ICB
Financier: Self Financed
Purchaser Ownership: Public
Tender Value: Refer Document
CPV Classification
38000000 - Laboratory, optical and precision equipments (excl. glasses)
Purchaser's Detail
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Tender Details
The equipment to be procured is a Deep Reactive Ion Etching (DRIE) Si fluorine chemistry etcher. This will provide new capabilities of deep trench (Bosch process) and through-via etching to the IBC cleanroom. The equipment is procured through the MagKI investment programme which will provide advanced substrate structuring capabilites to the cleanroom which will be used in the final production of magnetic nanodevices for next-gen European based Artifical Intelligence. It will also offer near vertical sidewall profile of etched via's in Si, SiC as well as 2D materials, like graphene and MoS2. Beside the fulfilment of the criteria described under 2. Performance quote of this Annex A, the scope of deliveries and services includes and are part of the offer: - delivery at the place of usage according to DPU Dresden (Incoterms 2020) Place of usage: - the machine must be capable of operating in a cleanroom environment (ISO Class 6) with the sample loaded in an ISO class 4 / 5 environment. - the footprint, technical drawings, electrical drawings must be supplied in the documentation - user documentation in English and German - delivery, installation and SAT must be possible until 01 June 2027 - warranty of at least two years - place of performance: Helmholtz-Zentrum Dresden-Rossendorf e. V.; Ion Beam Center, building 711/ room 105; Bautzner Landstraße 400; 01328 Dresden - SAT in the cleanroom at the Ion Beam Center, building 711/ room 105. The main body of the tool ...
Document Type: Contract Notice Reference Number: EUOV2601 Contract Type: supplies Authority Type: pub-undert-cga Doc Title: Deep Reactive Ion Etching (DRIE) Si fluorine chemistry etcher Dispatch Date: 2026-03-24 Publish Date: 2026-03-26 Submission Date: 2026-04-28
Documents
Tender Notice