Ald System for Metal Oxide Coatings Tender in Germany - 109313467

Procurement Summary

Country: Germany

Summary: Ald System for Metal Oxide Coatings - Pr740152-2350-W

Deadline: 26 Nov 2024

Posting Date: 28 Oct 2024

Other Information

Notice Type: Tender

TOT Ref.No.: 109313467

Document Ref. No.: 654612-2024

Competition: ICB

Financier: Self Financed

Purchaser Ownership: Public

Tender Value: Refer Document

CPV Classification

42000000 - Industrial machinery

Purchaser's Detail

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Tender Details

As part of the Pero-Si-Scale project, a system for atomic layer deposition (ALD) is to be procured for the rapid and flexible deposition of various metal oxides on a sample surface (preferably one-sided deposition) of large-format (up to 210 mm x 210 mm silicon wafers, M12 format) perovskite/silicon tandem solar cells. For inert processing, the samples must be handled (loaded and unloaded) in a glovebox. The most important layers to be deposited in the ALD system are the electron-conducting SnOx layers. For such a 20 nm thick SnOx layer, which is deposited at 80 °C, the ALD system should have a throughput of at least 6 M12 wafers per hour. In addition to SnOx, it should also be possible to deposit other metal oxides such as Al2O3. Thermal ALD deposition of the metal oxides with water vapor is required for very gentle deposition. As the system will be used in an R&D environment, it needs to be flexible enough to be used with industry-relevant equipment and coating surfaces.
Doc Title: ALD system for metal oxide coatings - PR740152-2350-W
Contract Type: supplies
Document Type: Contract Notice

Reference Number: PR740152-2350-W

Contract Type: supplies

Authority Type: pub-undert

Doc Title: ALD system for metal oxide coatings - PR740152-2350-W

Dispatch Date: 2024-10-25

Publish Date: 2024-10-28

Submission Date: 2024-11-26

Documents

 Tender Notice