Procurement Summary
Country: Germany
Summary: Ald Facility
Deadline: 25 Aug 2026
Posting Date: 10 Aug 2026
Other Information
Notice Type: Tender
TOT Ref.No.: 146904091
Document Ref. No.: 551042-2026
Competition: ICB
Financier: Self Financed
Purchaser Ownership: Public
Tender Value: EUR 461344.00
CPV Classification
38000000 - Laboratory, optical and precision equipments (excl. glasses)
Purchaser's Detail
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Login to see detailsTender Details
ALD facility The Leibniz Institute for Photonic Technologies e.V. is tendering for a plasma-assisted atomic layer deposition system (PE-ALD for short) for thin film deposition, which is used to deposit Thin films should be used on different substrates from single chip format (5 x 5 mm²) to at least 150 mm wafers. The central requirements for the system are reproducible deposition processes of various conductive, semiconducting and dielectric layers. These should also be processed without interrupting the vacuum (multilayers). A control PC with monitor, keyboard, mouse, appropriate software licenses and the latest operating system (Win 11) must be supplied. Doc title: ALD facility Contract Type: supplies
Document Type: Contract Notice Reference Number: 01.26.O.00 Contract Type: supplies Estimated Value: 461344.00 - EUR Authority Type: org-sub Doc Title: ALD-Anlage Dispatch Date: 2026-08-07 Publish Date: 2026-08-10 Submission Date: 2026-08-25
Documents
Tender Notice