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Sputter Coater for Scanning Electron Microscopy Tender - 139675340

The COMMERCE, DEPARTMENT OF | NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY has issued a Tender notice for the procurement of a Sputter Coater for Scanning Electron Microscopy in the USA. This Tender notice was published on 17 Apr 2026 and is scheduled to close on 30 Apr 2026, with an estimated Tender value of Refer Document. Interested bidders can access detailed Tender information, eligibility criteria, and complete bidding documents by referencing TOT Ref No. 139675340, while the tender notice number is NIST-SS26-108 and Registering on the platform.

Procurement Summary

Country: USA

Summary: Sputter Coater for Scanning Electron Microscopy

Deadline: 30 Apr 2026

Posting Date: 17 Apr 2026

Other Information

Notice Type: Tender

TOT Ref.No.: 139675340

Document Ref. No.: NIST-SS26-108

Competition: ICB

Financier: Self Financed

Purchaser Ownership: Public

Tender Value: Refer Document

Purchaser's Detail

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Tender Details

Notice ID Number: NIST-SS26-108
Title: Sputter coater for scanning electron microscopy
The purpose of this sources sought notice is to conduct market research and identify potential sources of commercial products/services that satisfy the Government-s anticipated needs.
BACKGROUND
To support the CHIPS for America Act, the NIST Precision Imaging Facility (PIF) requires an ion milling system to provide final thinning to transmission electron microscope specimens. The coating system is intended to support the scanning electron microscope, focused ion beam, and transmission electron microscope instruments (among others) in the PIF.
NIST is seeking information from sources that may be capable of providing a solution that will achieve the objectives described above, in addition to the following essential requirements:
TECHNICAL REQUIREMENTS:
Line Item 0001: Sputter coater for scanning electron microscopy
Quantity: One (1)
Technical Specifications:
Function
The system shall be capable of depositing various metals from targets as well as carbon from “pencil” type or “braid” type carbon sources.
The metal sputtering targets and/or carbon evaporation source shall be user changeable.
Chamber/Stage
The system shall be able to sputter over specimens up to 50 mm/2 inches in diameter.
The chamber shall open such that loading and unloading specimens is simple for users.
The chamber/stage shall have spaces for multiple pin-stub style holders. The pin-stub stage shall be interchangeable for other application specific stages (e.g. wafer carriers, large specimen clamps).
Process Gasses:
The system shall be able to accommodate at least one process gas for sputtering (e.g. argon).
Vacuum System:
The system shall include or be compatible with a turbo pump and/or turbo pumping station.
The system shall include all vacuum pumps required to operate the system.
Any vacuum pumps or vacuum system comp...
Notice ID: nist-ss26-108

Department/Ind. Agency: commerce, department of

Sub-tier: national institute of standards and technology

Office: dept of commerce nist

NAICS Code: 334516 - Analytical Laboratory Instrument Manufacturing

Inactive Dates: may 15, 2026

Inactive Policy: 15 days after response date

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