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The COMMERCE, DEPARTMENT OF | NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY has issued a Tender notice for the procurement of a Sources Sought Notice for CHIPS RD Optical frequency comb, Control electronics in the USA. This Tender notice was published on 13 Dec 2025 and is scheduled to close on 26 Dec 2025, with an estimated Tender value of Refer Document. Interested bidders can access detailed Tender information, eligibility criteria, and complete bidding documents by referencing TOT Ref No. 132010122, while the tender notice number is NIST-SS26-CHIPS-52 and Registering on the platform.
Procurement Summary
Country: USA
Summary: Sources Sought Notice for CHIPS RD Optical frequency comb, Control electronics
Deadline: 26 Dec 2025
Posting Date: 13 Dec 2025
Other Information
Notice Type: Tender
TOT Ref.No.: 132010122
Document Ref. No.: NIST-SS26-CHIPS-52
Financier: Self Financed
Purchaser Ownership: Public
Tender Value: Refer Document
Purchaser's Detail
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Login to see detailsTender Details
The purpose of this sources sought notice is to conduct market research and identify potential sources of commercial products/services that satisfy the Government-s anticipated needs.
The semiconductor supply chain is global, specialized, and interconnected. Chipmakers do business with thousands of individual suppliers that provide the highly complex materials and tools used to produce semiconductors. To address the lack of full visibility into the semiconductors markets supply chain and R&D ecosystem gaps NIST will conduct the measurement science, or metrology, critical to the development of new materials, packaging, and production methods in chip manufacturing.
The CHIPS Metrology Program includes research in Grand Challenge 5, Modeling/Simulating Semiconductor Manufacturing Processes. To address this Grand Challenge, the project RF Waveform and Rapid Frequency-Comb Diagnostics for Plasma Etching seeks to purchase a Mid-Infrared Femtosecond Laser Source, Femtosecond Laser Control Electronics, and an Optical Frequency Reference, quantity one (1) each. The laser system and optical reference will enable the application of novel optical diagnostics like broadband laser spectroscopy to the study of chemical transformations in key plasma etching processes.
Plasma etching—performed across the semiconductor manufacturing ecosystem—is a highly nonlinear process involving arbitrary radiofrequency (RF) waveforms, dynamic electrical properties, and complex chemistry in a confined non-equilibrium environment. Metrology tools are needed to better correlate reactor inputs with etching outcomes, and to precisely evaluate consistency across plasma etching tools. To do so, we will develop µs time-resolved frequency comb diagnostics to meet industry needs including reliable in-situ monitoring of plasma chemistry and real-time data generation for intelligent design of next-generation plasma etching processes. This requires a mid-infrared femtosecond laser system (laser sour...
Notice ID: nist-ss26-chips-52
Department/Ind. Agency: commerce, department of
Sub-tier: national institute of standards and technology
Office: dept of commerce nist
Product Service Code: 6640 - laboratory equipment and supplies
NAICS Code: 334516 - Analytical Laboratory Instrument Manufacturing
Inactive Dates: jan 10, 2026
Inactive Policy: 15 days after response date
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