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Sources Sought for Electron Beam Evaporator Tender in USA - 42015723

The DEPT OF DEFENSE has issued a Tender notice for the procurement of a Sources Sought for Electron Beam Evaporator in the USA. This Tender notice was published on 02 Apr 2020 and is scheduled to close on 08 Apr 2020, with an estimated Tender value of Refer Document. Interested bidders can access detailed Tender information, eligibility criteria, and complete bidding documents by referencing TOT Ref No. 42015723, while the tender notice number is W911QX20Q0061 and Registering on the platform.

Expired Tender

Procurement Summary

Country: USA

Summary: Sources Sought for Electron Beam Evaporator

Deadline: 08 Apr 2020

Posting Date: 02 Apr 2020

Other Information

Notice Type: Tender

TOT Ref.No.: 42015723

Document Ref. No.: W911QX20Q0061

Competition: ICB

Financier: Self Financed

Purchaser Ownership: -

Tender Value: Refer Document

Purchaser's Detail

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Tender Details

Sources Sought for Electron Beam Evaporator
Active Contract Opportunity
Notice ID : W911QX20Q0061
Related Notice
Department/Ind. Agency : DEPT OF DEFENSE
Sub-tier : DEPT OF THE ARMY
Major Command : AMC
Sub Command : ACC
Sub Command 2 : ACC-CTRS
Sub Command 3 : ACC-APG
Office : W6QK ACC-APG ADELPHI
General Information
Contract Opportunity Type: Sources Sought (Original)
All Dates/Times are: (UTC-04:00) EASTERN STANDARD TIME, NEW YORK, USA
Original Published Date: Apr 01, 2020 11:11 am EDT
Original Response Date: Apr 08, 2020 12:00 pm EDT
Inactive Policy: 15 days after response date
Original Inactive Date: Apr 23, 2020
Initiative: None
Classification
Original Set Aside:
Product Service Code: 6640 - LABORATORY EQUIPMENT AND SUPPLIES
NAICS Code: 334516 - Analytical Laboratory Instrument Manufacturing
Place of Performance: Adelphi, MD 20783 USA
Description
The Army Research Laboratory (ARL) and Sensors and Electron Devices Directorate (SEDD) Emerging Electronics Branch requires one (1) electron beam evaporator with three independent sources and power supplies for use on a molecular beam epitaxy system as follows:
The electron-beam evaporator must be mountable onto a conflat flange (4.5" or 2.75") of a molecular beam epitaxy deposition system and be capable of operating if positioned at an upward-looking orientation, or at 60 degrees off of the vertical axis.
The mounted orientation of the electron beam deposition system must allow real-time deposition monitoring by a separate reflection-high-energy-electron-diffraction (RHEED) apparatus.
The electron beam evaporator must have three (3) separate, independent electron beam hearths integrated onto the conflat flange from which different materials may be evaporated using three (3) separate power supplies, and each separate hearth must have its own flux monitor as well as the ability to interrupt the effluent flux by means of a mechanical shutter
The electron beam evaporator must be capable of using solid-source materials in the form of wires, small pellets, etc., as well as melted liquid sources, and have an electrostatic deflector at the tip to suppress ion emission from the source material during evaporation.
The electron-beam evaporator must be able to be delivered within three (3) months of contract award.

Documents

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