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The CARDIFF UNIVERSITY has issued a Tender notice for the procurement of a Purchase of Maskless Laser Lithography System in the United Kingdom. This Tender notice was published on 29 Jan 2026 and is scheduled to close on 11 Feb 2026, with an estimated Tender value of Refer Document. Interested bidders can access detailed Tender information, eligibility criteria, and complete bidding documents by referencing TOT Ref No. 134664754, while the tender notice number is and Registering on the platform.
Procurement Summary
Country: United Kingdom
Summary: Purchase of Maskless Laser Lithography System
Deadline: 11 Feb 2026
Posting Date: 29 Jan 2026
Other Information
Notice Type: Tender
TOT Ref.No.: 134664754
Document Ref. No.:
Financier: Self Financed
Purchaser Ownership: Public
Tender Value: Refer Document
Purchaser's Detail
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Login to see detailsTender Details
The Institute for Compound Semiconductors (ICS) intends to procure a maskless laser lithography system to support essential expansion of its hybrid electro‑optical lithography capability. The system will enable processing in which wafers are exposed using both electron‑beam lithography and optical radiation within the same resist layer(s), or across multiple aligned resist layers. ICS has previously invested €2.5 M in a state‑of‑the‑art electron beam lithography platform capable of patterning nanoscale features down to 10 nm. To fully realise the benefits of hybrid lithography workflows, ICS requires a complementary optical lithography system capable of producing large‑area exposures (several millimetres) with feature sizes down to approximately 300 nm, while maintaining extremely high positioning and overlay accuracy with respect to electron‑beam‑defined structures. The required system must incorporate: a high‑resolution optically encoded stage with positioning fidelity on the order of 1 nm; the capability for stitch‑free patterning across full wafers up to 200 mm in diameter; demonstrated overlay accuracy of approximately 15 nm (optical‑to‑electron‑beam alignment); software and workflow compatibility to support integrated hybrid lithography between electron‑beam and optical exposures. ICS has undertaken a technical review of the market and believes that only one supplier Raith can provide a maskless laser lithography system meeting these combined requirements for stage prec...
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