Procurement Summary
Country : USA
Summary : Plasma Diagnostic Suite
Deadline : 08 Jul 2024
Other Information
Notice Type : Tender
TOT Ref.No.: 103141258
Document Ref. No. : NIST-SS24-CHIPS-0073
Financier : Self Financed
Purchaser Ownership : Public
Tender Value : Refer Document
Purchaser's Detail
Name :Login to see tender_details
Address : Login to see tender_details
Email : Login to see tender_details
Login to see detailsTender Details
Description
NIST Nanocalorimetry for Semiconductors and Semiconductor Process Metrology project requires a plasma diagnostic suite (PDS) which will be used as a benchmark for testing the NIST Nanocalorimetry platform for plasma semiconductor process metrology under the CHIPS act. The plasma diagnostic suit will include a Langmuir probe for general bulk plasma characterization, Retarding field ion energy analyzer, Quartz microbalance sensor for plasma deposition monitoring (if any) and reactive radicals flux monitoring. The PDS will be used inside the same test plasma reactor chamber where Nanocalorimetry plasma sensors (NPS) will be tested to evaluate the performance of NPS against the state-of-the-art PDS.
NIST is seeking information from sources that may be capable of providing a commercial item solution that meets or exceeds the following draft minimum specifications:
1. Langmuir probe for bulk plasma diagnostics in three custom built chambers
1.1. Total probe length: 500 mm -550 mm.
1.2. Movable design for spatial diagnostics, such that the probe sensor position can be moved in and out at least 250 mm.
1.3. Sensitivity: 15nA - 150mA
1.4. Replaceable tips and in-situ tips self-cleaning capability
1.5. RF signal filters for: 13.56 MHz, 94 MHz, 40 kHz excitations
1.6. Capability of collect time-averaged, time-resolved and triggered electrical measurements with frequencies 100 Hz
1.7. High Vacuum compatibility and operational temperature up to T=100 C
2. Sensors for substrate level plasma diagnostics
2.1. Retarding Field Energy Analyzer for ion velocity and energy distribution in RF plasma (frequency range 100 kHz up to 80 MHz); with ion flux sensitivity better than 10-4 A/cm2 up to 10-7 A/cm2; with max RF bias +/-800 V and max DC bias 1000 V.
2.2. Integrated quartz crystal microbalance sensor covered with sp2 carbon film for etching rate measurements by reactive radicals.
2.3. Temperature co...
Active Contract Opportunity Notice ID NIST-SS24-CHIPS-0073 Related Notice Department/Ind. Agency COMMERCE, DEPARTMENT OF Sub-tier NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY Office DEPT OF COMMERCE NIST
General Information
Contract Opportunity Type: Sources Sought (Original)
All Dates/Times are: (UTC-04:00) EASTERN STANDARD TIME, NEW YORK, USA
Original Published Date: Jun 24, 2024 03:53 pm EDT
Original Response Date: Jul 08, 2024 11:00 am EDT
Inactive Policy: 15 days after response date
Original Inactive Date: Jul 23, 2024
Initiative: None
Classification
Original Set Aside:
Product Service Code: 6640 - LABORATORY EQUIPMENT AND SUPPLIES
NAICS Code: 334516 - Analytical Laboratory Instrument Manufacturing
Place of Performance: Gaithersburg, MD 20899 USA
Documents
Tender Notice