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UNIVERSITY OF WATERLOO has floated a tender for Nanoimprint Lithography System. The project location is Canada and the tender is closing on 25 Aug 2025. The tender notice number is 2026-RFPN-00251 CH, while the TOT Ref Number is 123647197. Bidders can have further information about the Tender and can request the complete Tender document by Registering on the site.
Procurement Summary
Country: Canada
Summary: Nanoimprint Lithography System
Deadline: 25 Aug 2025
Other Information
Notice Type: Tender
TOT Ref.No.: 123647197
Document Ref. No.: 2026-RFPN-00251 CH
Financier: Self Financed
Purchaser Ownership: Public
Tender Value: Refer Document
Purchaser's Detail
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Login to see detailsTender Details
The Nanoimprint Lithography System is being acquired for the purposes of patterning semiconductor and nanodevice samples ranging from small pieces up to 100 mm round wafers. Substrate materials may be silicon, glass, various III-V and II-VI materials, diamond, steel and flexible substrates such as Kapton. It is important that the system be robust in nature and construction, possess maximum flexibility in operations, be easy to use and forgiving of inexperienced operators.The system is intended to be used primarily for UV nanoimprint lithography. The University welcomes nanoimprint lithography systems which operate by plate-to-plate and roll-to-plate methods.
Solicitation Type : RFP - Request for Proposal (Formal)
Reference Number : 0000299360
Location : Canada, Ontario, Kitchener-Waterloo-Barrie
Purchase Type : One Time Only- Delivery Date:2025/11/15
Description : The Nanoimprint Lithography System is being acquired for the purposes of patterning semiconductor and nanodevice samples ranging from small pieces up to 100 mm round wafers. Substrate materials may be silicon, glass, various III-V and II-VI materials, diamond, steel and flexible substrates such as Kapton. It is important that the system be robust in nature and construction, possess maximum flexibility in operations, be easy to use and forgiving of inexperienced operators.The system is intended to be used primarily for UV nanoimprint lithography. The University welcomes nanoimprint lithography systems which operate by plate-to-plate and roll-to-plate methods.
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