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COMMERCE, DEPARTMENT OF | NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY has floated a tender for Nanofabrication service - Combined Sources Sought/Notice of Intent to Sole Source. The project location is USA and the tender is closing on 27 Aug 2025. The tender notice number is NB305000-25-02608, while the TOT Ref Number is 124846954. Bidders can have further information about the Tender and can request the complete Tender document by Registering on the site.
Procurement Summary
Country: USA
Summary: Nanofabrication service - Combined Sources Sought/Notice of Intent to Sole Source
Deadline: 27 Aug 2025
Other Information
Notice Type: Tender
TOT Ref.No.: 124846954
Document Ref. No.: NB305000-25-02608
Financier: Self Financed
Purchaser Ownership: Public
Tender Value: Refer Document
Purchaser's Detail
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Login to see detailsTender Details
Description
***THIS IS A COMBINED SOURCES SOUGHT NOTICE AND NOTICE OF INTENT TO SOLE SOURCE***
The National Institute of Standards and Technology (NIST) is seeking information from sources that may be capable of providing a Differential Laser Doppler Vibrometer. If no alternate sources are identified, the Government intends to issue a Sole Source Award to NHanced Semiconductors INC.; 800 Perimeter Park DR, Morrisville, NC 27560-7271 USA) under the authority of FAR 13.106-1(b). The North American Industry Classification System (NAICS) code for this acquisition is 334413
NIST has a need for one (1) Differential Laser Doppler Vibrometer that meets or exceeds the following draft minimum specifications:
Line Item 0001: Dry etching service
Description: Lithography and dry etching processes are implemented to create patterns provided by customer
Quantity: Two (2) wafers
Technical Specifications A mask is produced based on the pattern provided by customer. A different mask can be used for each wafer. Lithography and dry etching processes are implemented on the patterns transferred from the mask. 200 mm wafers are used.
Line Item 0002: Additional dry etching service (optional)
Description: Lithography and dry etching processes are implemented to create patterns provided by customer
Quantity: Two (2) wafers
Technical Specifications A mask is produced based on the pattern provided by customer. A different mask can be used for each wafer. Lithography and dry etching processes are implemented on the patterns transferred from the mask. 200 mm wafers are used.
Line Item 0003: Barrier/seed layers deposition service
Description: Barrier/seed layers are deposited for electroplating processes on etched wafers
Quantity: Two (2) wafers
Technical Specifications Barrier/seed layer deposition process is implemented on wafers with dry-etched holes. 200 mm wafers are used.
Line Item 0004: Additional barrier/seed l...
Active Contract Opportunity
Notice ID : NB305000-25-02608
Related Notice
Department/Ind. Agency : COMMERCE, DEPARTMENT OF
Sub-tier : NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY
Office: DEPT OF COMMERCE NIST
General Information
Contract Opportunity Type: Special Notice (Original)
Original Published Date: Aug 20, 2025 02:37 pm EDT
Original Response Date: Aug 27, 2025 11:00 am EDT
Inactive Policy: 15 days after response date
Original Inactive Date: Sep 11, 2025
Initiative: None
Classification
Original Set Aside:
Product Service Code: 6640 - LABORATORY EQUIPMENT AND SUPPLIES
NAICS Code: 334413 - Semiconductor and Related Device Manufacturing
Place of Performance: Gaithersburg, MD 20899 USA
Documents
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