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Integrated Uhv Cluster for Pulsed Laser Deposition Tender - 142414288

The ETH ZÜRICH - ABT. PROCUREMENT & EXPORT SERVICES has issued a Tender notice for the procurement of a Integrated Uhv Cluster for Pulsed Laser Deposition and Sputtering of Thin Films in the Switzerland. This Tender notice was published on 01 Jun 2026 and is scheduled to close on 12 Jul 2026, with an estimated Tender value of Refer Document. Interested bidders can access detailed Tender information, eligibility criteria, and complete bidding documents by referencing TOT Ref No. 142414288, while the tender notice number is 38049-01 and Registering on the platform.

Expired Tender

Procurement Summary

Country: Switzerland

Summary: Integrated Uhv Cluster for Pulsed Laser Deposition and Sputtering of Thin Films

Deadline: 12 Jul 2026

Posting Date: 01 Jun 2026

Other Information

Notice Type: Tender

TOT Ref.No.: 142414288

Document Ref. No.: 38049-01

Competition: ICB

Financier: Self Financed

Purchaser Ownership: Public

Tender Value: Refer Document

CPV Classification

38000000 - Laboratory, optical and precision equipments (excl. glasses)

Purchaser's Detail

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Tender Details

The Laboratory for Inorganic Chemistry at ETH Zurich is planning to procure an integrated UHV cluster for pulsed laser deposition (PLD) and sputter deposition of heterostructures made of oxide and metal layers. The system is intended to facilitate material synthesis Allow oxide substrates with an area of ​​up to 10 x 10 mm2. It will consist of a PLD chamber, a sputtering chamber, a central UHV transfer chamber and a lock chamber for exchanging samples and PLD targets, excluding the process chambers to ventilate. All chambers must have base pressures below 1 x 10-7 mbar. The PLD chamber must be equipped with a KrF excimer laser and in-situ high pressure RHEED and for routine epitaxial oxide growth at high temperatures around 1100 °C be suitable. The sputtering chamber must enable DC and RF magnetron sputtering of metal and oxide layers, including reactive sputtering in Ar/O₂ atmospheres, with substrate heating up to at least 700 °C using a sample support system that is compatible with the PLD chamber is compatible. The system must allow sample transfer to an external UHV transfer case and provide UHV-compatible ports for future expansion of the cluster. For further details see specification document. Main CPV: 38000000 laboratory devices, optical devices and precision devices (except glasses)
Contract duration: Not specified Round of questions 1, Submit by: 15.06.2026 Submission of tender: 12.07.2026, 18:00 Tender valid until: 180 Days after submission deadline Opening of tenders: 13.07.2026, 10:00

Documents

 Tender Notice


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