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High-Vacuum Chamber for Thin-Film Synthesis Tender - 128661489

The UNIVERSITY OF HELSINKI has issued a Tender notice for the procurement of a High-Vacuum Chamber for Thin-Film Synthesis in the Finland. This Tender notice was published on 22 Oct 2025 and is scheduled to close on 20 Nov 2025, with an estimated Tender value of Refer Document. Interested bidders can access detailed Tender information, eligibility criteria, and complete bidding documents by referencing TOT Ref No. 128661489, while the tender notice number is 697754-2025 and Registering on the platform.

Expired Tender

Procurement Summary

Country: Finland

Summary: High-Vacuum Chamber for Thin-Film Synthesis

Deadline: 20 Nov 2025

Posting Date: 22 Oct 2025

Other Information

Notice Type: Tender

TOT Ref.No.: 128661489

Document Ref. No.: 697754-2025

Competition: ICB

Financier: Self Financed

Purchaser Ownership: Public

Tender Value: Refer Document

CPV Classification

38000000 - Laboratory, optical and precision equipments (excl. glasses)

Purchaser's Detail

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Tender Details

The Helsinki Accelerator Laboratory (HAL) at the Department of Physics of the University of Helsinki (UH) is going to acquire a multi-source high vacuum (HV) chamber for thin-film deposition using magnetron sputtering. The magnetron sources will be capable of operating in direct-current magnetron sputtering (DCMS), radio-frequency magnetron sputtering (RFMS), and high-power impulse magnetron sputtering (HiPIMS) modes. Key feature of the deposition chamber will be the ability to accommodate and deposited homogeneously on substrates with diameter up to 8 inches (203.2 mm). A quick access port for loading and unloading substrates with a diameter up to 8 inches (203.2 nm) to the deposition chamber will be available. Moreover, the chamber design will allow provisionally for future functional expansion including installing a thermal evaporator for thin film deposition and a load-lock chamber for transferring samples to the deposition chamber without vacuum cycle interruption. RFMS and HiPIM power supplies, as well as instrumentation for thin film thermal evaporation, and load-lock chamber are not part of this tender. HAL is a leading materials science environment in Finland. The current research at HAL focuses on materials of importance for nanotechnology, micro- and optoelectronics, fusion technology, and particle detectors. Material properties are studied by applying various ion beam-based techniques, as well as by computational means. With regards to thin-film synthesis, the HAL...
Document Type: Contract Notice

Reference Number: 582031

Contract Type: supplies

Authority Type: body-pl

Doc Title: High-vacuum chamber for thin-film synthesis

Dispatch Date: 2025-10-21

Publish Date: 2025-10-22

Submission Date: 2025-11-20

Documents

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