Procurement Summary
Country : Switzerland
Summary : Eine Sputtering-anlage Ecole Polytechnique Fédérale De Lausanne (epfl) Laboratory of Photonic and Quantum Measurements (lpqm)
Deadline : 09 Oct 2023
Other Information
Notice Type : Tender
TOT Ref.No.: 88004897
Document Ref. No. : 1359193
Financier : Self Financed
Purchaser Ownership : Public
Tender Value : Refer Document
Purchaser's Detail
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Login to see detailsTender Details
Epfl intends to acquire a sputtering facility for its Center of Micronanotechnology (CMI) in 2023-2024 Quantum Electrodynamics And Quantum Optomechanics Used :•Magnetron Sputtering Of Superconducting Films Focusing On The Following Criteria:Ouniformity At 100mm Wafer Scaleability To Sputter Two Types Of Materials Without Breaking Vacuum•Static Oxidation In Loadlock Or A Specialized Oxidation Chamber After Deposition Of Metal Films Or Printing Should Can Reach 0.05 Mbar To 10 Mbar•Ion Source For Sample Preparation
Requirement office/Awarding office: Ecole Polytechnique Fédérale de Lausanne (EPFL) Procurement office/organizer: Ecole Polytechnique Fédérale de Lausanne (EPFL) Laboratory of photonic and quantum measurements (LPQM), attn. by Professor Tobias J. Kippenberg, Bâtiment PH - Station 03, 1015 Lausanne, Switzerland, email: marco.scigliuzzo@epfl.ch
Publish Date:29.08.2023
Procurement object
2.1 Type of delivery order: purchase
2.2 Project title of procurement: A sputtering system
2.3 File number / project number: 2321-23851
2.4 Division into lots?: No
2.5 Community Vocabulary:
2.6 Object and scope of the contract: EPFL intends to acquire a sputtering facility for its Center of MicroNanotechnology (CMi) in 2023-2024 for parametric traveling wave amplifiers and superconducting resonators for quantum electrodynamics and quantum optomechanics :•Magnetron sputtering of superconducting layers with emphasis on the following criteria:oConformity at 100 mm wafer scaleoAbility to sputter two types of materials without breaking the vacuum•Static oxidation in the loadlock or a special one Oxidation chamber after deposition of metal layers or pressure should be able to reach 0.05 mBar to 10 mBar•Ion source for sample preparation
2.7 Place of delivery: See specifications.
2.8 Duration of the contract...
Documents
Tender Notice