Procurement Summary
Country: USA
Summary: CHIPS RD RSoXS Upgrade Package Combined Sources SoughtNotice of Intent to Sole Source
Deadline: 26 Jan 2026
Posting Date: 13 Jan 2026
Other Information
Notice Type: Tender
TOT Ref.No.: 133589089
Document Ref. No.: NIST-SS26-CHIPS-59
Financier: Self Financed
Purchaser Ownership: Public
Tender Value: Refer Document
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***THIS IS A COMBINED SOURCES SOUGHT NOTICE AND NOTICE OF INTENT TO SOLE SOURCE***
The National Institute of Standards and Technology (NIST) Materials Measurement Lab is upgrading the resonant soft X-ray scattering (RSoXS) through station at National Synchrotron Light Source-IIas part of a project in the CHIPS Metrology program. The through station is used for measuring the microstructure and local chemistry of a variety of soft matter systems including those used in photolithography, organic electronics, water membranes, and biological systems. The through station is operated as part of the general user program at NSLS-II and is available for use through a proposal review system. The through station is situated on the SST1 beamline (https://www.bnl.gov/nsls2/beamlines/beamline.php?r=7-ID-1).
The RSoXS through station is being upgraded to allow soft X-ray reflectivity and a method called resonant critical dimension small angle scattering (res-CDSAXS). These measurements will enhance the ability of the through station to characterize new materials for photolithography. This requirement necessitates a system with the sample and the detector on a 2-circle goniometer in the vacuum chamber. The upgrade will also add a high throughput sample exchange system to increase the sample throughput of the through station.
An upgraded RSoXS through station will be installed on the SST1 beamline at NSLS-II. This upgrade will enable the through station to conduct soft X-ray reflectivity and resonant critical dimension small angle scattering. This upgrade will also enable the chamber to utilize new high frame rate soft X-ray cameras.The higher frame rate will be critical for faster measurements, which will result in higher sample throughput at the end-station along with minimizing X-ray dose on beam sensitive samples such as EUV photoresists.
NIST is seeking information from sources that may be capable of providing a solution that will achieve the objectives described ab...
Notice ID: nist-ss26-chips-59
Department/Ind. Agency: commerce, department of
Sub-tier: national institute of standards and technology
Office: dept of commerce nist
Product Service Code: 6640 - laboratory equipment and supplies
NAICS Code: 334517 - Irradiation Apparatus Manufacturing
Inactive Dates: feb 10, 2026
Inactive Policy: 15 days after response date
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